Mr. Shingo Anzai
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Contamination, Visualization, Signal attenuation, Air contamination, Transmittance, Photomasks, Ozone, Halftones, Photoresist processing, Mask cleaning

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Polymers, Molecules, Diffusion, Coating, Manufacturing, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

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