Mr. Shingo Kanamitsu
at Toshiba Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Etching, X-rays, Image quality, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Image processing, Scanning electron microscopy, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Backscatter, Solids, Photomasks, Beam shaping, Nanoimprint lithography, Data conversion, Photoresist processing

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Etching, Error analysis, Manufacturing, Surface roughness, Image analysis, Bridges, Photomasks, Chemical reactions, Semiconducting wafers, Industrial chemicals

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Defect detection, Opacity, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Etching, Image resolution, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Gallium

Showing 5 of 10 publications
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