Mr. Shingo Maruyama
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Ultraviolet radiation, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Deep ultraviolet, Reflection, Imaging systems, Scanners, Manufacturing, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | January 25, 2008
Proc. SPIE. 6912, Practical Holography XXII: Materials and Applications
KEYWORDS: Diffraction, Holograms, Holography, 3D image reconstruction, 3D printing, Image quality, LCDs, Spatial resolution, Stereo holograms, 3D image processing

PROCEEDINGS ARTICLE | February 20, 2007
Proc. SPIE. 6488, Practical Holography XXI: Materials and Applications
KEYWORDS: Diffraction, Optical design, Prisms, Cell phones, Waveguides, Spatial frequencies, LCDs, Diffusers, LED backlight, Diffraction gratings

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