Shingo Murakami
Manager at NEC Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Defect detection, Deep ultraviolet, Opacity, Inspection, Reflectivity, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Image acquisition, Optical inspection, Image transmission, Photomasks, 193nm lithography, Defect inspection

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Point spread functions, Image processing, Inspection, Optical inspection, Image sensors, Image transmission, Photomasks, Image enhancement, Computer aided design, Laser optics

PROCEEDINGS ARTICLE | May 19, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Image sensors, Objectives, Image transmission, Photomasks, Laser optics

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Point spread functions, Deep ultraviolet, Inspection, Chromium, Photomasks, Optical proximity correction, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Detection and tracking algorithms, Deep ultraviolet, Databases, Inspection, Photomasks, Optical proximity correction, Algorithm development, Binary data

Showing 5 of 8 publications
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