Shingo Yoshikawa
Photomask Development Technical Director at Dai Nippon Printing Co Ltd
Publications (7)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, 3D acquisition, Defect detection, Manufacturing, Image analysis, Scanning electron microscopy, 3D metrology, Bridges, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Standards development, 193nm lithography, Defect inspection

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Opacity, Inspection, Bridges, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Opacity, Image processing, Inspection, Electroluminescence, Transmittance, Photomasks, Excimer lasers, Semiconducting wafers, Phase shifts

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Scanning electron microscopy, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Defect inspection

Proceedings Article | 21 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Quartz, Ions, Nitrogen, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 7 publications
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