Shinichi Hatakeyama
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Etching, Image processing, Coating, Image analysis, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Data modeling, Calibration, Polymers, Diffusion, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Performance modeling

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Image processing, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Image processing, Scanners, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Double patterning technology, Photoresist processing

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Calibration, Etching, Dielectrophoresis, Monte Carlo methods, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 8 publications
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