Dr. Shinichi Igarashi
Technical Manager at Shin-Etsu Chemical Co Ltd
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Opacity, Etching, Resistance, Inspection, Chromium, Photomasks, Optical proximity correction, SRAF, Photoresist processing

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