Dr. Shinichi Kojima
Dir of R&D at Advantest Corp
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | August 5, 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Monte Carlo methods, Photomasks, Line width roughness, Semiconductor manufacturing, Nanoimprint lithography, Photoresist processing

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Logic, Reflectivity, YAG lasers, Computer aided design, Semiconducting wafers, Direct write lithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Metrology, Modulation, Silicon, Reflectivity, Integrated optics, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Reflectivity, Electroluminescence, Monte Carlo methods, Computer aided design, Semiconducting wafers, Direct write lithography

PROCEEDINGS ARTICLE | July 1, 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Distortion, Scanning electron microscopy, Integrated optics, Beam shaping, Photomicroscopy, Semiconducting wafers, Charged-particle lithography

Showing 5 of 7 publications
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