Shinichi Nakajima
at Nikon Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Data modeling, Control systems, Distortion, Data processing, Thermal effects, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Microscopes, Data modeling, Sensors, Error analysis, Computing systems, Image sensors, Signal processing, Software development, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Statistical analysis, Particles, Distortion, Computer simulations, Optical alignment, Neodymium, Semiconducting wafers, Expectation maximization algorithms, Visibility

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Microscopes, Monochromatic aberrations, Spatial frequencies, Reflectivity, Image analysis, Optical alignment, Neodymium, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

PROCEEDINGS ARTICLE | July 30, 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Diffraction, Reticles, Detection and tracking algorithms, Sensors, Reflectivity, Distortion, Optical alignment, Algorithm development, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | August 22, 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Microscopes, Wavelet transforms, Detection and tracking algorithms, Image processing, Picosecond phenomena, Optical alignment, Algorithm development, Semiconducting wafers, Signal detection, Overlay metrology

Showing 5 of 7 publications
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