Shinichi Takase
at NTT Advanced Technology Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517996
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Data modeling, Optical lithography, Lithography, Optimization (mathematics), Manufacturing, Model-based design, Printing

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504380
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Data modeling, Optical lithography, Lithography, Manufacturing, Printing, Model-based design, Process modeling

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