Shinichi Takase
at NTT Advanced Technology Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Printing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling

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