Shinji Akima
at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Publications (22)

Proceedings Article | 27 June 2019 Paper
Masashi Yonetani, Karen Badger, Jed Rankin, Shinji Akima, Yusuke Toda, Itaru Yoshida, Masayuki Kagawa, Takeshi Isogawa, Yutaka Kodera, Jan Heumann, Anka Birnstein
Proceedings Volume 11178, 111780D (2019)
KEYWORDS: Inspection, Extreme ultraviolet, Defect inspection, Photomasks, Opacity, Optical inspection, Signal detection, Critical dimension metrology, Extreme ultraviolet lithography, Defect detection

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 99851Y (2016)
KEYWORDS: Inspection, Defect inspection, Photomasks, Semiconducting wafers, Critical dimension metrology, Defect detection, Optical inspection, Extreme ultraviolet, Wafer inspection, Lithography

SPIE Journal Paper | 18 March 2016
Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing Qi, Jed Rankin, Shinji Akima
JM3, Vol. 15, Issue 02, 021010, (March 2016)
KEYWORDS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Multilayers, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Microscopes, Scanning electron microscopy, Manufacturing

SPIE Journal Paper | 1 February 2016
Kazunori Seki, Takeshi Isogawa, Masayuki Kagawa, Shinji Akima, Yutaka Kodera, Karen Badger, Zhengqing John Qi, Mark Lawliss, Jed Rankin, Ravi Bonam
JM3, Vol. 15, Issue 02, 021004, (February 2016)
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Wafer inspection, Multilayers, Visibility, Overlay metrology

Proceedings Article | 23 October 2015 Paper
Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing John Qi, Jed Rankin, Shinji Akima
Proceedings Volume 9635, 963518 (2015)
KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Multilayers, Manufacturing, Microscopes, Lithography, Airborne remote sensing, Reflectivity

Showing 5 of 22 publications
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