Shinji Akima
Senior Manager at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Defect detection, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Defect inspection

SPIE Journal Paper | 18 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Multilayers, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Microscopes, Scanning electron microscopy, Manufacturing

SPIE Journal Paper | 1 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Wafer inspection, Multilayers, Visibility, Overlay metrology

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Microscopes, Multilayers, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Phase contrast, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Overlay metrology, Visibility

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Microscopes, Electron beams, Etching, Reflectivity, Bridges, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Lawrencium

Showing 5 of 21 publications
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