Shinji Kobayashi
Sr. Specialist at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Image processing, Image analysis, Scanning electron microscopy, Gaussian filters, Image filtering, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Statistical analysis, Monte Carlo methods, Bridges, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Statistical analysis, Data modeling, Etching, Control systems, Bridges, Line width roughness, Critical dimension metrology, Manufacturing equipment, Error control coding, Semiconducting wafers, Digital electronics, Stochastic processes, Overlay metrology

Proceedings Article | 21 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Process control, Wafer inspection, Plasma etching, Error control coding, Semiconducting wafers, System on a chip, Overlay metrology, Device simulation, Tin

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Etching, Particles, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 18 publications
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