Shinji Kobayashi
Expert at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Edge detection, Statistical analysis, Denoising, Image analysis, Scanning electron microscopy, Image filtering, Line width roughness, Critical dimension metrology, Stochastic processes, Correlation function

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Image processing, Image analysis, Scanning electron microscopy, Gaussian filters, Image filtering, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 25 March 2019 Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Statistical analysis, Monte Carlo methods, Bridges, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Statistical analysis, Data modeling, Etching, Control systems, Bridges, Line width roughness, Critical dimension metrology, Manufacturing equipment, Error control coding, Semiconducting wafers, Digital electronics, Stochastic processes, Overlay metrology

Showing 5 of 19 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top