Shinji Kunitani
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Metrology, Data modeling, Metals, Image registration, Data processing, Photomasks, Semiconducting wafers, Overlay metrology, Model-based design

Proceedings Article | 16 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Reticles, Metrology, Error analysis, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Overlay metrology, Model-based design

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconductors, Scattering, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, Neodymium, Carbon monoxide, Photomask technology

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Defect detection, Databases, Inspection, Design for manufacturing, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers, Quantum chromodynamics, Defect inspection

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Metrology, Image processing, Silicon, Process control, Photomasks, Mask making, Optical alignment, Reactive ion etching, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beams, Defect detection, Inspection, Scanning electron microscopy, Printing, Image quality, Photomasks, Semiconducting wafers, Charged-particle lithography, Defect inspection

Showing 5 of 6 publications
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