Dr. Shinji Okazaki
at ALITECS Corp.
SPIE Involvement:
Fellow status | Conference Program Committee | Author
Publications (54)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Light sources, Laser development, Carbon dioxide lasers, Amplifiers, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Light sources, High power lasers, Laser applications, Carbon dioxide lasers, Solid state lasers, Magnetism, Amplifiers, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation, Tin

PROCEEDINGS ARTICLE | February 22, 2017
Proc. SPIE. 10097, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI
KEYWORDS: Lithography, Mirrors, Light sources, Carbon dioxide lasers, Amplifiers, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Mirrors, Light sources, High power lasers, Ions, Carbon dioxide lasers, Control systems, Extreme ultraviolet, Pulsed laser operation, Plasma, Laser systems engineering, Tin

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Light sources, Carbon dioxide, High power lasers, Ions, Carbon dioxide lasers, Magnetism, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Laser systems engineering, Tin

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Mirrors, Light sources, Carbon dioxide, Ions, Laser applications, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Plasma, Tin

Showing 5 of 54 publications
Conference Committee Involvement (12)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 12 published special sections
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