Dr. Shinji Omori
at Sony Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Etching, Copper, Resistance, Inspection, Photomasks, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Back end of line

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beams, Metrology, Scanners, Distortion, Data processing, Photomasks, Semiconducting wafers, Data corrections, Overlay metrology

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Image processing, Error analysis, Distortion, Computer simulations, Data processing, Finite element methods, Photomasks, Chemical elements

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Defect detection, Opacity, Etching, Inspection, Monte Carlo methods, Photomasks, Photoresist processing, Semiconducting wafers

SPIE Journal Paper | 1 July 2004
JM3 Vol. 3 Issue 03
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

Showing 5 of 14 publications
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