Shinji Tanaka
Chief Researcher at Idemitsu Kosan Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Transparency, Optical lithography, Polymers, Glasses, Silicon, Scanning electron microscopy, Extreme ultraviolet lithography, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Transparency, Optical lithography, Polymers, Glasses, Sulfur, Extreme ultraviolet lithography, Immersion lithography, Radium

PROCEEDINGS ARTICLE | March 27, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Transparency, Magnesium, Chemical species, Polymers, Sulfur, Atomic force microscopy, Line edge roughness, Radium

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Electron beam lithography, Magnesium, Etching, Glasses, Nitrogen, Resistance, Line width roughness, Sodium, Line edge roughness

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