Shinji Wakamoto
Manager at Nikon Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Atrial fibrillation, Calibration, Scanners, Time metrology, Feedback loops, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconductors, Logic, Optical lithography, Etching, Metals, Transistors, Immersion lithography, Line edge roughness, Reactive ion etching, Photoresist processing

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Distortion, Source mask optimization, Optical alignment, Motion models, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Interferometers, Calibration, Scanners, Control systems, Distortion, Computer programming, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Metrology, Interferometers, Sensors, Computer programming, Servomechanisms, Artificial intelligence, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Etching, Distortion, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 14 publications
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