Dr. Shinn-Sheng Yu
Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (21)

SPIE Press Book | 7 April 2018

Proceedings Article | 19 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Aluminum, Extreme ultraviolet lithography, Optical proximity correction, Light

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Diffraction, Scanners, Reflectivity, Chromium, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Resolution enhancement technologies

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Diffraction, Lithographic illumination, Signal attenuation, Electroluminescence, Projection systems, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Phase shifts

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Diffusion, Image resolution, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Modulation transfer functions, Performance modeling

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Imaging systems, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

Showing 5 of 21 publications
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