Shinroku Maejima
at Renesas Technology Corp
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Diffraction, Apodization, Optical lithography, Polarization, Radiometric corrections, Magnetism, Image filtering, Photomasks, Electromagnetism

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Logic, Image processing, Photography, Scanning electron microscopy, Printing, Transmittance, Photomasks, Immersion lithography, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 26 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Phase modulation, Databases, Scanners, Distortion, Semiconducting wafers, Factor analysis, Overlay metrology, Distributed interactive simulations

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Imaging systems, Opacity, Photography, Image acquisition, Chromium, Scanning electron microscopy, Image transmission, Photomasks, Optical proximity correction

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Reticles, Databases, Scanners, Error analysis, Control systems, Distortion, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 16 publications
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