Shintaro Kudo
at Nikon Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Error analysis, Distortion, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Refractive index, Lithographic illumination, Error analysis, Scanning electron microscopy, Head, Photomasks, Source mask optimization, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Etching, Chromium, Printing, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Binary data, Resolution enhancement technologies

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