Dr. Shintaro Yamada
Sr. Chemist at DuPont Electronics & Industrial
SPIE Involvement:
Publications (18)

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12055, PC1205508 (2022) https://doi.org/10.1117/12.2612350
KEYWORDS: Wet etching, Resistance, Metals, Etching, Tin, Image processing, Titanium, Polymers, Polymer thin films, Plasma

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120F (2021) https://doi.org/10.1117/12.2583630
KEYWORDS: Etching, Absorbance, Carbon, Resistance, System on a chip, Reactive ion etching, Polymers, Image processing, Photoresist materials, Optical lithography

Proceedings Article | 23 March 2020 Paper
Li Cui, Iou-Sheng Ke, Anton Chavez, Keren Zhang, Paul LaBeaume, Suzanne Coley, Shintaro Yamada, Jim Cameron, Lei Zhang, William Marshall, Benjamin Foltz
Proceedings Volume 11326, 113261N (2020) https://doi.org/10.1117/12.2552024
KEYWORDS: System on a chip, Polymers, Etching, Resistance, Carbon, Polymer thin films, X-rays, FT-IR spectroscopy, Reactive ion etching

Proceedings Article | 23 March 2020 Paper
Iou-Sheng (Ike) Ke, Sheng Liu, Keren Zhang, Li Cui, Suzanne Coley, Shintaro Yamada, Jim Cameron
Proceedings Volume 11326, 1132617 (2020) https://doi.org/10.1117/12.2549015
KEYWORDS: System on a chip, Etching, Thin film coatings, Polymers, Resistance, Carbon, Chemical vapor deposition, Coating, Reactive ion etching, Silicon

Proceedings Article | 25 March 2019 Paper
Keren Zhang, Li Cui, Shintaro Yamada, Jim Cameron, Sabrina Wong, Lawrence Chen, Suzanne Coley, Dan Greene, Joshua Kaitz, Iou-Sheng Ke, Bhooshan Popere, Paul LaBeaume, Benjamin Foltz, Lei Zhang, Kenneth Kearns, Johnpeter Ngunjiri
Proceedings Volume 10960, 1096019 (2019) https://doi.org/10.1117/12.2514968
KEYWORDS: Chemical vapor deposition, Carbon, Polymers, Resistance, Coating, Etching, 193nm lithography, Materials

Showing 5 of 18 publications
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