Prof. Shinya Fujinawa
at Ritsumeikan Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 4 January 2006
Proc. SPIE. 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
KEYWORDS: Lithography, Diffraction, X-rays, X-ray diffraction, Near field diffraction, Photomasks, Scanning probe microscopy, Synchrotron radiation, X-ray lithography, Submicron lithography

Proceedings Article | 4 January 2006
Proc. SPIE. 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
KEYWORDS: Fabrication, Optical components, Lithography, Diffraction, Polymethylmethacrylate, X-rays, Synchrotron radiation, Tantalum, Submicron lithography, Diffraction gratings

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