Dr. Shinya Minegishi
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 1 April 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Electron beam lithography, Metrology, Optical lithography, Silica, Etching, Metals, Manufacturing, Scanning electron microscopy, Photomasks, Directed self assembly, Semiconductor manufacturing, Epitaxy, Reactive ion etching, Photoresist processing, Semiconducting wafers, Tin, Chemical mechanical planarization

Proceedings Article | 1 April 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Etching, Polymers, Silicon, Electron microscopes, Transmission electron microscopy, Surface properties, Directed self assembly, Reactive ion etching, Molecular self-assembly

Proceedings Article | 23 March 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silica, Polymers, Metals, Silicon, Manufacturing, Scanning electron microscopy, Photomasks, Directed self assembly, Semiconductor manufacturing, Reactive ion etching, Chemical mechanical planarization

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Metals, Silicon, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, System on a chip, Standards development, Chemically amplified resists

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Contamination, Metals, Germanium, Silicon, Hydrogen, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Chemical elements, Zirconium

Showing 5 of 14 publications
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