Polymer optical waveguide devices are getting popular for next generation FTTH application. In order to accelerate the development of polymer optical devices, evaluation of waveguide characteristics should be speeded up. Polymer optical chip containing a combination of 45°-angled cut waveguide, Y-splitter and S-bend structures was designed and fabricated for simple evaluation of multimode waveguides. Input launching such as light source, mode scrambler was investigated for reliable measurement.
High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.