Mr. Shinya Wakamizu
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Contamination, Particles, Coating, Process control, Image filtering, Bridges, Immersion lithography, High volume manufacturing, Thin film coatings, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Scanners, Particles, Coating, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Bridges, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, 193nm lithography, Defect inspection

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Image processing, Silicon, Scanning electron microscopy, Data processing, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Etching, Photography, Lens design, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Etching, Capillaries, Ions, Silicon, Scanning electron microscopy, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top