Shinya Wakamizu
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Contamination, Particles, Coating, Process control, Image filtering, Bridges, Immersion lithography, High volume manufacturing, Thin film coatings, Semiconducting wafers

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Scanners, Particles, Coating, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Bridges, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, 193nm lithography, Defect inspection

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Image processing, Silicon, Scanning electron microscopy, Data processing, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 22 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Etching, Photography, Lens design, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

Showing 5 of 7 publications
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