Dr. Shiro Kusumoto
Manager at JSR Engineering Co Ltd
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Water, Coating, Surface properties, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Etching, Coating, Line width roughness, Double patterning technology, Critical dimension metrology, Neodymium, Photoresist processing, Semiconducting wafers, Factor analysis

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Etching, Water, Scanning electron microscopy, Double patterning technology, Immersion lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Lithographic illumination, Etching, Chemical species, Polymers, Resistance, Photoresist materials, Immersion lithography, Fluorine, 193nm lithography

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Water, Image processing, Materials processing, Digital watermarking, Photoresist materials, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 11 publications
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