Dr. Shiro Kusumoto
Manager at JSR Engineering Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Surface properties, Water, Immersion lithography, Lithography, Photoresist processing, Thin film coatings, Semiconducting wafers, Defect inspection, Coating, Line width roughness

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Photoresist processing, Critical dimension metrology, Line width roughness, Lithography, Coating, Double patterning technology, Semiconducting wafers, Factor analysis, Etching, Neodymium

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Manufacturing, Etching, Semiconducting wafers, Scanning electron microscopy, Image processing, Photomasks

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Double patterning technology, Critical dimension metrology, Lithography, Optical lithography, Photoresist processing, Immersion lithography, Scanning electron microscopy, Semiconducting wafers, Water, Etching

Proceedings Article | 23 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

Showing 5 of 11 publications
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