Dr. Shiyong Yi
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Semiconductors, Optical lithography, Annealing, Resistance, Scanning electron microscopy, Photoresist materials, Directed self assembly, Critical dimension metrology, Semiconducting wafers, Molecular self-assembly

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electronics, Optical lithography, Image compression, Polymers, Diffusion, Electroluminescence, Photoresist materials, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Reflectivity, Control systems, Electroluminescence, Scanning electron microscopy, Photomasks, Line width roughness, Immersion lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Silicon, Chemistry, Photomasks, Line width roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Line edge roughness, Photoresist developing, Temperature metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Sensors, Polymers, Ultraviolet radiation, Photoresist materials, Polymerization, Palladium, Manganese, Critical dimension metrology, Line edge roughness

Showing 5 of 8 publications
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