Dr. Shiyong Yi
Principal Engineer at Dongwoo Fine-Chem Co Ltd
SPIE Involvement:
Publications (8)

Proceedings Article | 26 March 2013 Paper
Jaewoo Nam, Eun Sung Kim, Daekeun Kang, Hangeun Yu, Kyoungseon Kim, Shiyong Yi, Chul-Ho Shin, Ho-Kyu Kang
Proceedings Volume 8680, 868011 (2013) https://doi.org/10.1117/12.2011631
KEYWORDS: Annealing, Resistance, Photoresist materials, Critical dimension metrology, Optical lithography, Scanning electron microscopy, Semiconductors, Molecular self-assembly, Semiconducting wafers, Directed self assembly

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483
KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671
KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

Proceedings Article | 4 May 2005 Paper
Yool Kang, Jin Hong, Shi-Yong Lee, Hyung-Rae Lee, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599484
KEYWORDS: Etching, Line width roughness, Lithography, Silicon, Dry etching, Photomasks, Photoresist processing, Semiconducting wafers, Chemistry, Optical lithography

Proceedings Article | 14 May 2004 Paper
Hyun-Woo Kim, Hyung-Rae Lee, Kyung-Mee Kim, Shi Yong Lee, Bong-Cheol Kim, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534806
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Line edge roughness, Photoresist processing, Diffusion, Lithography, Temperature metrology, Scanners, Scatterometry

Showing 5 of 8 publications
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