Dr. Shiyu Sun
Senior Process Integration Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Scanning electron microscopy, Line width roughness, Double patterning technology, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Resistance, Scanning electron microscopy, Photoresist materials, Photomasks, Double patterning technology, Line edge roughness

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Manufacturing, Chemical vapor deposition, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers

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