Shlomit Katz
at KLA Israel
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 27 April 2023 Presentation + Paper
Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna
Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074
KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns

Proceedings Article | 27 April 2023 Poster + Presentation + Paper
Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Yuqian Zhang
Proceedings Volume 12496, 1249613 (2023) https://doi.org/10.1117/12.2655161
KEYWORDS: Near infrared, Opacity, Metrology, 3D metrology, Photoresist processing, Overlay metrology, Image processing, Etching, Optical gratings

Proceedings Article | 27 April 2023 Poster + Paper
Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar
Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681
KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization

Proceedings Article | 26 May 2022 Presentation + Paper
Shlomit Katz, Yoav Grauer, Efi Megged
Proceedings Volume 12053, 120530N (2022) https://doi.org/10.1117/12.2605863
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, 3D metrology, Semiconductors, Opacity, Optical parametric oscillators, Infrared imaging, 3D acquisition, Photoresist processing

Proceedings Article | 26 May 2022 Poster + Paper
Proceedings Volume 12053, 120531E (2022) https://doi.org/10.1117/12.2608241
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconductors, Semiconductor manufacturing, Manufacturing, Inspection, Standards development

Showing 5 of 11 publications
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