Shlomit Katz
at KLA Israel
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Metrology, Optical parametric oscillators, 3D acquisition, 3D metrology, Overlay metrology, Imaging metrology

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Computer simulations, Overlay metrology

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Amorphous silicon, Wafer-level optics, Etching, Semiconducting wafers, Tin, Chemical mechanical planarization

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Photovoltaics, 3D acquisition, Scanning electron microscopy, Optimization (mathematics), Semiconducting wafers, Overlay metrology, Imaging metrology, 3D image processing

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, 3D modeling, Machine learning, Semiconducting wafers, Performance modeling, Overlay metrology

Showing 5 of 6 publications
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