Dr. Shmoolik Mangan
Physics R&D Manager at Orbotech Ltd
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 17 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Integrated circuit design, Airborne remote sensing, Phase shifts

Proceedings Article | 16 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Logic, Scanners, Scatterometry, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mathematical modeling, Data modeling, Databases, Image processing, Inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Prototyping, Solid modeling

Proceedings Article | 24 January 2012 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 31 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top