Shogo Matsumaru
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Lithography, Diffusion, Extreme ultraviolet, Polymers, Chemically amplified resists, High volume manufacturing, Semiconductor manufacturing, Semiconductors, Quantum efficiency, Electrons, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymers, Extreme ultraviolet, Quantum efficiency, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Chemically amplified resists, High volume manufacturing, Polymer thin films, Diffusion

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Polymers, Plasma, Argon, Printing, Surface roughness, Lithography, FT-IR spectroscopy, Scanning electron microscopy, Photoresist processing, Electroluminescence

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Line edge roughness, Ions, Scanning electron microscopy, Lithography, Etching, Polymers, Electron beams, Silicon, Semiconducting wafers, Inspection

Showing 5 of 6 publications
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