Mr. Shogo Matsumaru
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Polymers, Electrons, Diffusion, Quantum efficiency, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Polymers, Diffusion, Quantum efficiency, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Polymer thin films, Chemically amplified resists

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Contamination, Scanners, Photomasks, Double patterning technology, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Photomasks, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Argon, Polymers, Surface roughness, Electroluminescence, Scanning electron microscopy, Printing, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Electron beams, Etching, Polymers, Ions, Silicon, Inspection, Scanning electron microscopy, Line edge roughness, Semiconducting wafers

Showing 5 of 6 publications
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