Shogo Narukawa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Defect detection, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Data modeling, Modulation, Scattering, Calibration, Ions, Manufacturing, Electroluminescence, Photomasks, Extreme ultraviolet

PROCEEDINGS ARTICLE | April 22, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Sensors, Quartz, Silicon, Image resolution, Photomasks, Semiconducting wafers, Signal detection, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Photomasks, Vestigial sideband modulation, Chemical mechanical planarization, Current controlled current source

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Metrology, Data storage, Metals, Inspection, Printing, Photomasks, Data conversion, Data storage servers, Standards development, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Semiconductors, Metals, Error analysis, Manufacturing, Inspection, Software development, Design for manufacturing, Photomasks, Optical proximity correction, Defect inspection

Showing 5 of 25 publications
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