Shogo Narukawa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Defect detection, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Data modeling, Modulation, Scattering, Calibration, Ions, Manufacturing, Electroluminescence, Photomasks, Extreme ultraviolet

Proceedings Article | 22 April 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Sensors, Quartz, Silicon, Image resolution, Photomasks, Semiconducting wafers, Signal detection, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 26 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Photomasks, Vestigial sideband modulation, Chemical mechanical planarization, Current controlled current source

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Metrology, Data storage, Metals, Inspection, Printing, Photomasks, Data conversion, Data storage servers, Standards development, Vestigial sideband modulation

Showing 5 of 25 publications
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