Dr. Shoji Hotta Profile

Dr. Shoji Hotta

at Hitachi Ltd

SPIE Involvement:

Author

Publications (20)

SPIE Journal Paper | 12 October 2016

Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography

Nobuhiro Okai, Erin Lavigne, Keiichiro Hitomi, Scott Halle, Shoji Hotta, Shunsuke Koshihara, Atsuko Yamaguchi, Junichi Tanaka, Todd Bailey

JM3, Vol. 15, Issue 04, 044001, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.044001

KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

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SPIE Journal Paper | 19 July 2016

Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process

Keiichiro Hitomi, Scott Halle, Marshal Miller, Ioana Graur, Nicole Saulnier, Derren Dunn, Nobuhiro Okai, Shoji Hotta, Atuko Yamaguchi, Hitoshi Komuro, Toru Ishimoto, Shunsuke Koshihara, Yutaka Hojo

JM3, Vol. 15, Issue 03, 034002, (July 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.034002

KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

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Proceedings Article | 19 March 2015 Paper

Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography

Nobuhiro Okai, Erin Lavigne, Keiichiro Hitomi, Scott Halle, Shoji Hotta, Shunsuke Koshihara, Junichi Tanaka, Todd Bailey

Proceedings Volume 9424, 94240H (2015) https://doi.org/10.1117/12.2175841

KEYWORDS: Extreme ultraviolet, Electron beams, Extreme ultraviolet lithography, Scanning electron microscopy, Precision measurement, Metrology, Image processing, Optical testing, Error analysis, Electron microscopes

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Proceedings Article | 2 April 2014 Paper

Correction of EB-induced shrinkage in contour measurements

Takeyoshi Ohashi, Shoji Hotta, Atsuko Yamaguchi, Junichi Tanaka, Hiroki Kawada

Proceedings Volume 9050, 90500J (2014) https://doi.org/10.1117/12.2047563

KEYWORDS: Calibration, Data modeling, Scanning electron microscopy, Optical proximity correction, Electron microscopes, Image acquisition, Electron beams, Metrology, Cadmium sulfide, Image restoration

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Proceedings Article | 2 April 2014 Paper

Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography

Nobuhiro Okai, Erin Lavigne, Keiichiro Hitomi, Scott Halle, Shoji Hotta, Shunsuke Koshihara, Karen Petrillo, Atsuko Yamaguchi, Junichi Tanaka, Todd Bailey

Proceedings Volume 9050, 90501X (2014) https://doi.org/10.1117/12.2045375

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Electron beams, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Metrology, Precision measurement, Photomasks, Image processing

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Proceedings Article | 31 March 2014 Paper

Hybrid OPC modeling with SEM contour technique for 10nm node process

Keiichiro Hitomi, Scott Halle, Marshal Miller, Ioana Graur, Nicole Saulnier, Derren Dunn, Nobuhiro Okai, Shoji Hotta, Atsuko Yamaguchi, Hitoshi Komuro, Toru Ishimoto, Shunsuke Koshihara, Yutaka Hojo

Proceedings Volume 9052, 90520W (2014) https://doi.org/10.1117/12.2047678

KEYWORDS: Optical proximity correction, Data modeling, Scanning electron microscopy, Critical dimension metrology, Metals, Instrument modeling, Calibration, Metrology, Logic devices, OLE for process control

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SPIE Journal Paper | 11 December 2012

Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis

Shoji Hotta, Timothy Brunner, Scott Halle, Keiichiro Hitomi, Takeshi Kato, Atsuko Yamaguchi

JM3, Vol. 11, Issue 4, 043011, (December 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.4.043011

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Photoresist processing, Scatterometry, Electron microscopes, Metrology, Photomasks, Critical dimension metrology, Detection and tracking algorithms, Algorithm development

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Proceedings Article | 5 April 2012 Paper

Methodology for establishing CD-SEM robust metrology algorithm for development cycles applications

Keiichiro Hitomi, Erin Lavigne, Shoji Hotta, Yoshinori Momonoi, Matthew Colburn, Atsuko Yamaguchi, Katsuhiro Sasada, Tatsuya Maeda

Proceedings Volume 8324, 83241G (2012) https://doi.org/10.1117/12.916492

KEYWORDS: Metrology, Critical dimension metrology, Photoresist materials, Etching, Image processing, Algorithm development, Lithography, Double patterning technology, Cadmium, Semiconductors

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Proceedings Article | 10 March 2012 Paper

Dose-focus monitor technique using CD-SEM and application to local variation analysis

Shoji Hotta, Timothy Brunner, Scott Halle, Keiichiro Hitomi, Takeshi Kato, Atsuko Yamaguchi

Proceedings Volume 8324, 832405 (2012) https://doi.org/10.1117/12.916413

KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Critical dimension metrology, Photomasks, Detection and tracking algorithms, Photoresist processing, Algorithm development, Process control, Lithography

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SPIE Journal Paper | 1 April 2011

Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes

Shoji Hotta, Takumichi Sutani, Scott Halle, Daniel Moore, Chas Archie, Akiyuki Sugiyama, Masahiko Ikeno, Atsuko Yamaguchi, Kazuyoshi Torii

JM3, Vol. 10, Issue 02, 023014, (April 2011) https://doi.org/10.1117/12.10.1117/1.3599867

KEYWORDS: Overlay metrology, Scanning electron microscopy, Double patterning technology, Electron microscopes, Data modeling, Semiconducting wafers, Optical lithography, Lithography, Error analysis, Wafer-level optics

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Proceedings Article | 2 April 2010 Paper

Spatial signature in local overlay measurements: what CD-SEM can tell us and optical measurements can not

Scott Halle, Daniel Moore, Chas Archie, Shoji Hotta, Takumichi Sutani, Akiyuki Sugiyama, Masahiko Ikeno, Atsuko Yamaguchi, Kazuyoshi Torii

Proceedings Volume 7638, 76381V (2010) https://doi.org/10.1117/12.846665

KEYWORDS: Overlay metrology, Double patterning technology, Scanning electron microscopy, Data modeling, Wafer-level optics, Optical testing, Lithography, Semiconducting wafers, Metrology, Visualization

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Proceedings Article | 2 April 2010 Paper

Concerning the influence of pattern symmetry on CD-SEM local overlay measurements for double patterning of complex shapes

Shoji Hotta, Takumichi Sutani, Akiyuki Sugiyama, Masahiko Ikeno, Atsuko Yamaguchi, Kazuyoshi Torii, Scott Halle, Daniel Moore, Chas Archie

Proceedings Volume 7638, 76381T (2010) https://doi.org/10.1117/12.846674

KEYWORDS: Overlay metrology, Double patterning technology, Scanning electron microscopy, Semiconducting wafers, Optical lithography, Control systems, Metrology, Lithography, Algorithm development, Detection and tracking algorithms

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Proceedings Article | 6 December 2004 Paper

R-mask: a new concept and its application for small-volume production

Katsuya Hayano, Shoji Hotta, Norio Hasegawa, Kunihiro Hosono, Toshihiko Tanaka, Kazuyuki Suko, Shiho Sasaki, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.572200

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Inspection, Defect inspection, Logic devices, Photography, Scanning electron microscopy, Critical dimension metrology, Manufacturing

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Proceedings Article | 28 May 2004 Paper

New double exposure technique using alternating phase-shifting mask with reversed phase

Shoji Hotta, Katsuya Hayano, Kazuyuki Kakuta, Norio Hasegawa

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535152

KEYWORDS: Photomasks, Phase shifts, Reticles, Lithography, Tolerancing, Double patterning technology, Error analysis, Binary data, Silicon, Semiconducting wafers

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Proceedings Article | 5 September 2001 Paper

Simulation of image quality issues at low k1 for 100-nm lithography

Andrew Neureuther, Konstantinos Adam, Shoji Hotta, Thomas Pistor, Garth Robins, Yunfei Deng

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438395

KEYWORDS: Photomasks, Monochromatic aberrations, Phase shifts, Lithography, Printing, Quartz, Image quality, Extreme ultraviolet, Spherical lenses, Near field

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Proceedings Article | 22 January 2001 Paper

Modeling defect-feature interactions in the presence of aberrations

Andrew Neureuther, Shoji Hotta, Konstantinos Adam

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410717

KEYWORDS: Monochromatic aberrations, Spherical lenses, Photomasks, Halftones, Wafer inspection, Phase shifts, Interferometry, Calibration, Inspection, Inspection equipment

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Proceedings Article | 22 January 2001 Paper

Effects of shifter edge topography on through focus performance

Shoji Hotta, Thomas Pistor, Konstantinos Adam, Andrew Neureuther

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410765

KEYWORDS: Photomask technology

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Proceedings Article | 5 July 2000 Paper

Precise CD control of 140-nm gate patterns using phase-edge PSM

Shoji Hotta, Osamu Inoue, Hiroshi Fukuda, Norio Hasegawa

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388973

KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Control systems, Phase shifts, Logic devices, Excimer lasers, Optical lithography, Dry etching, Optical proximity correction

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Proceedings Article | 5 July 2000 Paper

0.3-um pitch random interconnect patterning with node connection phase-shifting mask: experiments and simulations

Hiroshi Fukuda, Shoji Hotta

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389024

KEYWORDS: Photomasks, Optical proximity correction, Logic, Phase shifts, Deep ultraviolet, Optical lithography, Semiconducting wafers, Reticles, Lithography, Optical calibration

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Proceedings Article | 29 June 1998 Paper

Optimization of exposure procedures for sub-quarter-micron CMOS applications

Shoji Hotta, Toshihiko Onozuka, Keiko Fukumoto, Seiichiro Shirai, Shinji Okazaki

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310790

KEYWORDS: Critical dimension metrology, Binary data, Phase shifts, Halftones, Photomasks, Photoresist processing, Optical lithography, Logic devices, Semiconducting wafers, Materials processing

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Showing 5 of 20 publications

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