Dr. Shoji Hotta
at Hitachi Ltd
SPIE Involvement:
Author
Publications (20)

SPIE Journal Paper | 12 October 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

SPIE Journal Paper | 19 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Electron beams, Metrology, Image processing, Error analysis, Electron microscopes, Optical testing, Scanning electron microscopy, Precision measurement, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Electron beams, Metrology, Data modeling, Calibration, Image restoration, Image acquisition, Electron microscopes, Scanning electron microscopy, Cadmium sulfide, Optical proximity correction

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Electron beams, Metrology, Image processing, Precision measurement, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Calibration, Metals, Scanning electron microscopy, Logic devices, Optical proximity correction, Critical dimension metrology, OLE for process control, Instrument modeling

Showing 5 of 20 publications
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