Dr. Shoji Mimotogi
Specialist at Toshiba Corp
SPIE Involvement:
Author
Publications (49)

SPIE Journal Paper | August 7, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Transmission electron microscopy, Calibration, Process modeling, Computer simulations, Optimization (mathematics), System on a chip, Image processing, Directed self assembly

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Finite-difference time-domain method, Computer simulations, Wave propagation, Finite element methods, Photomasks, Electromagnetism, Radio propagation, Maxwell's equations

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Ultraviolet radiation, Manufacturing, Design for manufacturing, Directed self assembly, Source mask optimization, Computational lithography, Photoresist processing

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Polymethylmethacrylate, Data modeling, Calibration, Computer simulations, 3D modeling, Transmission electron microscopy, Design for manufacturing, Directed self assembly, Picosecond phenomena, System on a chip

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Finite-difference time-domain method, Wavefronts, Computer simulations, Wave propagation, Photomasks, Electromagnetism, Phase velocity, Radio propagation

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Lithography, Optical lithography, Etching, Line width roughness, Directed self assembly, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Nanoimprint lithography, Critical dimension metrology

Showing 5 of 49 publications
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