Sho Shen Lee
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Double patterning technology, Critical dimension metrology, Molybdenum, Semiconducting wafers, Overlay metrology, Information operations

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Target detection, Etching, Control systems, Time metrology, Process control, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Imaging metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Antireflective coatings, Ions, Silicon, Reflectivity, Scanning electron microscopy, Silicon films, Transmittance, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Metals, Manufacturing, Electroluminescence, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scatterometry, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Temperature metrology, Single crystal X-ray diffraction

Showing 5 of 6 publications
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