Sho Shen Lee
at United Microelectronics Corp
SPIE Involvement:
Publications (6)

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105851R (2018)
KEYWORDS: Optical alignment, Semiconducting wafers, Reticles, Overlay metrology, Data modeling, Neodymium, HVAC controls, Distortion, Calibration, Roads

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105851H (2018)
KEYWORDS: Overlay metrology, Etching, Lithography, Semiconducting wafers, Metrology, Critical dimension metrology, Molybdenum, Information operations, Optical lithography, Double patterning technology

Proceedings Article | 16 March 2016 Paper
Chia Ching Lin, En Chuan Lio, Chang Mao Wang, Howard Chen, Sho Shen Lee, Henry Hsing, Kince Liu, Nuriel Amir
Proceedings Volume 9781, 978118 (2016)
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Overlay metrology, Etching, Target detection, Time metrology, Imaging metrology, Control systems, Semiconductor manufacturing, Process control

Proceedings Article | 1 April 2009 Paper
Hung-Chin Huang, Yong-Fa Huang, Steven Wu, Louis Jang, Sho-Shen Lee, George K. Huang, Howard Chen, Chun-Chi Yu, Tomoki Kurihara, Hitoshi Fukiya, Hiromu Yoshida, Yoshihiro Yamamoto
Proceedings Volume 7273, 72730M (2009)
KEYWORDS: Transmittance, Semiconducting wafers, Lithography, Silicon, Antireflective coatings, Ions, Photoresist processing, Reflectivity, Scanning electron microscopy, Silicon films

Proceedings Article | 7 March 2008 Paper
Sho-Shen Lee, Cheng-Han Wu, Yongfa Huang, Chien-Hui Huang, Hung-Chin Huang, George KC Huang, Chun-Chi Yu, Michael Hsu, Simon Shieh, Stephen Hsu, T. B. Chiao
Proceedings Volume 6924, 69242X (2008)
KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Semiconducting wafers, Manufacturing, Polarization, Electroluminescence, Printing, Critical dimension metrology, Metals

Showing 5 of 6 publications
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