Shu-Fang Chen
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Lithography, Contamination, Polymers, Scanners, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Scattering, Polymers, Diffusion, Inspection, Printing, Line width roughness, Semiconductor manufacturing, Immersion lithography, Optics manufacturing, Resolution enhancement technologies

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Etching, Polymers, Ultraviolet radiation, Molecules, Wet etching, Ozone, Photoresist processing, Semiconducting wafers, Natural surfaces

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