Shu-Hao Chang
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Aluminum, Extreme ultraviolet lithography, Optical proximity correction, Light

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Lithography, Contamination, Polymers, Scanners, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Contamination, Polymers, Scanners, Electroluminescence, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Statistical modeling

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Diffusion, Image resolution, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Modulation transfer functions, Performance modeling

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Imaging systems, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

Showing 5 of 6 publications
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