Mr. Shu-Hao Dennis Hsu
Project Manager at
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Publications (8)

PROCEEDINGS ARTICLE | March 28, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Statistical analysis, Lithographic illumination, Diffractive optical elements, Polymers, Diffusion, Electroluminescence, Photoresist materials, Line width roughness, Immersion lithography

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Materials processing, Manufacturing, Extreme ultraviolet, Double patterning technology, Overlay metrology

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Diffusion, Amplifiers, Double patterning technology, Chemical reactions, Thin film coatings, Photoresist processing, Industrial chemicals

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Antireflective coatings, Reflection, Water, Coating, Reflectivity, Corrosion, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Coherence (optics), Image processing, Chromium, Photoresist materials, Optical proximity correction, Line edge roughness, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Quartz, Manufacturing, Photomasks, Optical proximity correction, Neodymium, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 8 publications
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