Shu-Ping Fang
Principal Engineer at United Microelectronics Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Oxides, Deep ultraviolet, Annealing, Process control, Microelectronics, Integrated circuits, Double patterning technology, Chemical reactions, Critical dimension metrology, Astatine

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Coherence (optics), Image processing, Chromium, Photoresist materials, Optical proximity correction, Line edge roughness, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Cadmium, Etching, Atomic force microscopy, Scanning electron microscopy, Spectroscopic ellipsometry, Transistors, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Manufacturing, Printing, Photoresist materials, Optical resolution, Photomasks, Logic devices, Airborne remote sensing

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Lithography, Scanners, Copper, Manufacturing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Back end of line

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top