Shuichiro Ohara
Director at Nippon Control System Corp
SPIE Involvement:
Publications (6)

Proceedings Article | 29 September 2023 Paper
Masakazu Hamaji, Toshikazu Hayashi, Aki Shigeta, Rie Funoki, Shuichiro Ohara
Proceedings Volume 12915, 129150C (2023)
KEYWORDS: Tolerancing, Optical proximity correction, Mathematical optimization, Algorithm development, Manufacturing, Lithography, Photomasks

Proceedings Article | 16 October 2017 Presentation + Paper
Chris Spence, Quan Zhang, Vincent Shu, Been-Der Chen, Stanislas Baron, Yasuko Saito, Masakazu Hamaji, Yasuaki Horima, Shuichiro Ohara
Proceedings Volume 10451, 1045104 (2017)
KEYWORDS: Photomasks, Optical proximity correction, Lithography, SRAF, Mask making, Process modeling

Proceedings Article | 4 October 2016 Paper
Proceedings Volume 9985, 99851A (2016)
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 92350T (2014)
KEYWORDS: Photomasks, Optical proximity correction, Vestigial sideband modulation, Resolution enhancement technologies, Neodymium, Lithography, Computing systems, Extreme ultraviolet, Modulation, Acquisition tracking and pointing

Proceedings Article | 29 September 2010 Paper
Guangming Xiao, Dave Irby, Tom Cecil, David Kim, Shuichiro Ohara, Isao Aburatani
Proceedings Volume 7823, 78233T (2010)
KEYWORDS: Photomasks, SRAF, Vestigial sideband modulation, Optical alignment, Critical dimension metrology, Lithography, Optical proximity correction, Photovoltaics, Resolution enhancement technologies, Image segmentation

Showing 5 of 6 publications
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