Shuichiro Ohara
Director at Nippon Control System Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Photomasks, Optical proximity correction, Lithography, SRAF, Mask making, Process modeling

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Photomasks, Optical proximity correction, Vestigial sideband modulation, Resolution enhancement technologies, Neodymium, Lithography, Computing systems, Extreme ultraviolet, Modulation, Acquisition tracking and pointing

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, SRAF, Vestigial sideband modulation, Optical alignment, Critical dimension metrology, Lithography, Optical proximity correction, Photovoltaics, Resolution enhancement technologies, Image segmentation

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Nondestructive evaluation, Distributed computing, Data storage servers, Databases, Data storage, Data communications, Control systems, Photomask technology, Current controlled current source, Data conversion

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