Shuichiro Ohara
Director at Nippon Control System Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Photomasks, Optical proximity correction, SRAF, Mask making, Process modeling

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Modulation, Computing systems, Photomasks, Extreme ultraviolet, Acquisition tracking and pointing, Optical proximity correction, Neodymium, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Photovoltaics, Image segmentation, Photomasks, Optical proximity correction, SRAF, Optical alignment, Critical dimension metrology, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Data storage, Databases, Nondestructive evaluation, Control systems, Distributed computing, Data conversion, Data communications, Photomask technology, Data storage servers, Current controlled current source

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