CONFERENCE PROCEEDINGS
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Dr. Shuang Xu
at Wuhan Univ of Science and Technology
SPIE Involvement:
Author
Publications (4)
SPIE Journal Paper | 24 January 2019
Polarization aberration analysis in lithographic tools
OE Vol. 58 Issue 08
KEYWORDS: Polarization, Lithography, Imaging systems, Distortion, Nanoimprint lithography, Optical engineering, Photomasks, Lithographic illumination, Zernike polynomials, Semiconducting wafers
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Proceedings Article | 15 November 2018
Separation of variables based method for fast calculation of imaging system in lithographic tools
Proc. SPIE. 10964, Tenth International Conference on Information Optics and Photonics
KEYWORDS: Lithography, Imaging systems, Optical lithography, Photomasks, Optical proximity correction, Optical imaging, Image processing, Resolution enhancement technologies, Algorithm development, Computer simulations
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Proceedings Article | 7 November 2018
Polarization aberration measurement of lithographic tools
Proc. SPIE. 10819, Optical Metrology and Inspection for Industrial Applications V
KEYWORDS: Polarization, Lithography, Zernike polynomials, Distortion, Imaging systems, Data modeling, Manufacturing
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Proceedings Article | 12 January 2018
Image based method for aberration measurement of lithographic tools
Proc. SPIE. 10620, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology
KEYWORDS: Lithography, Imaging systems, Zernike polynomials, Distortion, Photomasks, Systems modeling, Wavefront aberrations, Reconstruction algorithms, Phase measurement, Image transmission
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