Dr. Shuang Xu Profile

Dr. Shuang Xu

at Wuhan Univ of Science and Technology

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 20 December 2019 Paper

Temperature compensation effect of different packaged FBGs under abrupt temperature changing environment

Li Xiong, Guozhang Jiang, Yongxing Guo, Shuang Xu, Yi Kuang

Proc. SPIE. 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019)

KEYWORDS: Fiber Bragg gratings, Sensors, Packaging, Adhesives, Prototyping, Environmental sensing, Optical design, Optical fibers

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Proceedings Article | 20 December 2019 Paper

Particle scattering field calculation and analysis based on Mie scattering theory

Cheng Liao, Shuang Xu, Zhenyuan Xia, Ruyi Ma

Proc. SPIE. 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019)

KEYWORDS: Light scattering, Particles, Scattering, Mie scattering, Semiconducting wafers, Polarization, Diffraction, Defect detection, Laser scattering, Rayleigh scattering

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Proceedings Article | 20 December 2019 Paper

A novel 3D profile measurement method based on digital photoelastic technology

Guanjun Chen, Bo Tao, Gongfa Li, Shuang Xu, Fei Zeng

Proc. SPIE. 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019)

KEYWORDS: Photoelasticity, Fringe analysis, Digital photography, 3D image processing, Structured light, Phase shifts, Phase shifting

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Proceedings Article | 20 November 2019 Paper

Embedded fiber Bragg grating strain sensor with enhanced sensitivity

Li Xiong, Guozhang Jiang, Yongxing Guo, Shuang Xu

Proc. SPIE. 11191, Advanced Sensor Systems and Applications IX

KEYWORDS: Fiber Bragg gratings, Sensors, Capillaries, Civil engineering, Structural design, Structural health monitoring, Optical fibers, Resistance

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SPIE Journal Paper | 24 January 2019

Polarization aberration analysis in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

OE Vol. 58 Issue 08

KEYWORDS: Polarization, Lithography, Imaging systems, Distortion, Nanoimprint lithography, Optical engineering, Photomasks, Lithographic illumination, Zernike polynomials, Semiconducting wafers

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Proceedings Article | 15 November 2018 Paper

Separation of variables based method for fast calculation of imaging system in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proc. SPIE. 10964, Tenth International Conference on Information Optics and Photonics

KEYWORDS: Lithography, Imaging systems, Optical lithography, Photomasks, Optical proximity correction, Optical imaging, Image processing, Resolution enhancement technologies, Algorithm development, Computer simulations

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Proceedings Article | 7 November 2018 Paper

Polarization aberration measurement of lithographic tools

Shuang Xu, Gongfa Li, Bo Tao, Yongxing Guo

Proc. SPIE. 10819, Optical Metrology and Inspection for Industrial Applications V

KEYWORDS: Polarization, Lithography, Zernike polynomials, Distortion, Imaging systems, Data modeling, Manufacturing

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Proceedings Article | 12 January 2018 Paper

Image based method for aberration measurement of lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proc. SPIE. 10620, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology

KEYWORDS: Lithography, Imaging systems, Zernike polynomials, Distortion, Photomasks, Systems modeling, Wavefront aberrations, Reconstruction algorithms, Phase measurement, Image transmission

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Showing 5 of 8 publications

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