Dr. Shuhui Kang
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Switches, Deep ultraviolet, Polymers, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: FT-IR spectroscopy, Switches, Polymers, Glasses, Diffusion, Image resolution, Photoresist materials, Solids, Extreme ultraviolet, Temperature metrology

Proceedings Article | 3 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Switches, Magnesium, Image processing, Atomic force microscopy, Photoresist materials, Image quality, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist developing

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Data modeling, Scattering, X-rays, X-ray sources, Silicon, Laser scattering, Reflectivity, Nanoimprint lithography

Proceedings Article | 3 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: FT-IR spectroscopy, Optical spheres, Data modeling, Polymers, Spectroscopy, Hydrogen, Photoresist materials, Solids, Line edge roughness, Polymer thin films

Showing 5 of 10 publications
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