Dr. Shuhui Kang
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

Proceedings Article | 3 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: X-rays, Reflectivity, Silicon, Data modeling, Metrology, X-ray sources, Scattering, Nanoimprint lithography, Lithography, Laser scattering

Proceedings Article | 3 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

Showing 5 of 10 publications
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