Mr. Shuichi Matsunari
at Nikon Corp
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Mirrors, Light sources, Contamination, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Protactinium, Alternate lighting of surfaces

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Light sources, Titanium dioxide, Metals, Ions, Silicon, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Carbon, Mirrors, Multilayers, Chemical species, Coating, Bioalcohols, Extreme ultraviolet, Extreme ultraviolet lithography, Protactinium, Oxidation

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Oxides, Carbon, Mirrors, Reflectivity, Bioalcohols, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Protactinium, Oxidation

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Carbon, Lithography, Mirrors, Gases, Reflectivity, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Natural surfaces, Protactinium

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Carbon, Mirrors, Reflectivity, Bioalcohols, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Protactinium, Oxidation

Showing 5 of 13 publications
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