Dr. Shuji Ding
at Clariant Chemicals Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Antireflective coatings, Multilayers, Etching, Reflectivity, Fourier transforms, Semiconducting wafers, Stereolithography, 193nm lithography, Bottom antireflective coatings

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Dry etching, Polymers, Silicon, Electroluminescence, Process control, Absorbance, Semiconducting wafers, 193nm lithography, Bottom antireflective coatings

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Refractive index, Optical lithography, Etching, Polymers, Fourier transforms, Scanning electron microscopy, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Etching, Polymers, Coating, Reflectivity, Fourier transforms, Silicon carbide, Neodymium, 193nm lithography, Bottom antireflective coatings

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Semiconductors, Lithography, Refractive index, Polymers, Reflectivity, Scanning electron microscopy, Chromophores, Line edge roughness, Photoresist processing, 193nm lithography

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Copper, Dielectrics, Fourier transforms, Photoresist materials, Aluminum, Semiconducting wafers

Showing 5 of 15 publications
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