Shuji Nakao
SPIE Involvement:
Publications (25)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Polarization, Photomasks, Electromagnetism, Image filtering, Diffraction, Optical lithography, Magnetism, Lithography, Apodization, Radiometric corrections

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Critical dimension metrology, Photography, Resolution enhancement technologies, Printing, Immersion lithography, Logic, Transmittance, Scanning electron microscopy, Image processing

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical proximity correction, Photomasks, Opacity, Scanning electron microscopy, Photography, Optical lithography, Image transmission, Imaging systems, Image acquisition, Chromium

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Scanning electron microscopy, Photography, Double patterning technology, Photomasks, Photoresist processing, Resolution enhancement technologies, Argon, Ion implantation, Current controlled current source

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, Critical dimension metrology, Phase shifts, Image transmission, Chromium, Quartz, Printing, Logic devices, Scanning electron microscopy, Image quality

Showing 5 of 25 publications
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